Electron-Beam Evaporation
Electron beam evaporation is employed to provide a vapor stream from materials
commonly difficult to evaporate with standard thermal techniques. An energetic
electron beam is targeted onto the source material which has the effect of increasing the
temperature. There is no intrinsic limit to the temperature which can be attained
using this method, in contrast to conventional radiative or indirect resistive heating
processes.
Mini electron beam evaporators are employed to give maximum control of the
evaporation rate at low fluxes and, importantly, to minimize contamination of the vapor
stream for sensitive application areas such as surface science or thin-film doping.
The construction of mini e-beam evaporators should therefore be aimed at
maximizing the evaporation control and minimizing contamination.
The MANTIS EV-Series mini e-beam evaporators are constructed from
high-quality, strictly UHV-compatible materials. The mounting hearth for the source
material(s) and the surrounding evaporation head are highly-efficiently cooled, ensuring a
rapid heat transfer to the cooling water. This allows all but the emission filament
and the source material to remain at near ambient temperature, ensuring negligible
outgassing during operation.
The sources are all equipped as standard with flux monitoring plates. These allow
precise determination of the flux emerging from the source, and hence give the user
excellent control of the deposition rate.
MANTIS QUAD-EV
evaporators use independent filaments, flux-monitoring plates and high-voltage connections
to allow each material to be evaporated independently of the other three. In the QUAD-EV-C
source, this is employed to allow independent co-evaporation of up to four materials.
Since each material uses an independent high-voltage connection, the evaporator
will still function if there is a short-circuit due to accidental overheating of material
in one of the pockets.
The power
supplies are of a rugged construction, enabling seamless operation without shut-down or
malfunction during discharges between the filament and source material (as can happen
during initial operation after pump-down).
All evaporators
can be equipped with either rods or crucibles interchangeably. The choice of which
of the two is used depends on the rate required, the material capacity required and the
properties of the source material. Please contact us for recommendations.
